Startup Substrate is building next-generation semiconductor fabs using advanced X-ray lithography. This goes beyond extreme ...

Extreme ultraviolet lithography (EUVL) has emerged as a cornerstone technology in the semiconductor industry, enabling the production of devices with sub-10 nm feature sizes. By utilising a 13.5 nm ...

New type of EUV lithography using only four reflective mirrors overturns conventional technology and will contribute to advanced semiconductors at 7nm and below Okinawa Institute of Science and ...

Building an integrated circuit (IC) requires various physical and chemical processes to be performed on a semiconductor (e.g., silicon) substrate. Millions of transistors can be fabricated and wired ...

A research team has developed a direct optical lithography (DOL) technology that patterns quantum dots (QDs) at ultra-high resolution using only light, without photoresist. Through this, they also ...

Professor Tsumoru Shintake of the Okinawa Institute of Science and Technology (OIST) has proposed an extreme ultraviolet (EUV) lithography technology that he claims is superior to the method currently ...

Fig. 1 The lithography process. The projection lithography system. The advancement of semiconductor manufacturing is a key driver of electronic device innovations. As Moore’s Law progresses, ...

SPIE, the international society for optics and photonics, awarded their Gold Medal to Maryellen Giger (pictured here with her team) for pioneering work in computer-aided diagnosis and image ...

Glass masks contribute to EUV mask blanks market expansion by offering exceptional surface smoothness, dimensional stability, ...

Few would expect the future of artificial intelligence (AI) to depend on Eindhoven, a quiet Dutch town. Yet just beyond its borders sits the headquarters of ASML, the only company that makes the ...

The 22 award recipients represent wide range of stellar achievements across light-based technologies. For pioneering work in ...