TOKYO--(BUSINESS WIRE)--Dai Nippon Printing Co., Ltd. (DNP) (TOKYO: 7912) has successfully developed a photomask manufacturing process capable of accommodating the 3-nanometer (10-9 meter) lithography ...

ACM Research, Inc. previously announced the delivery of its first Ultra Lith BK lithography system to a leading global display panel manufacturer, featuring ultraviolet curing uniformity of ±5% and ...

Unlike conventional lithography systems that require photomasks with circuit patterns, the DSP-100 uses a spatial light modulator (SLM) to directly project circuit patterns onto substrates without the ...

Schematic image of the basic steps for creating ordered silicon nanostructures through a mask of polystyrene nanospheres using the nanosphere lithography process ...

At the recent 2026 SPIE Advanced Lithography + Patterning Conference, imec demonstrated that precise control of gas compositions during post-exposure EUV lithography steps can hel ...

Continued scaling of integrated circuits to smaller dimensions is still a viable way to increase compute power, achieve higher memory cell density, or reduce power consumption. These days, chip makers ...

2019 marked an important milestone for extreme ultraviolet (EUV) lithography. In that year, the EUV patterning technology was for the first time deployed for the mass production of logic chips of the ...

LEUVEN, Belgium — This week, at SPIE 2023 Advanced Lithography + Patterning Conference, in San Jose, CA, imec, a world-leading research and innovation hub in nanoelectronics and digital technologies, ...

SAN JOSE — Ultratech Stepper Inc. today rolled out a new exposure tool, called the Star 100, which is aimed at serving lithography process steps with device feature sizes above 0.8 micron. The new ...